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Aligner, 2-Inch
KASPER-QUINTEL MODEL
17A
This instrument precisely
positions a photomask into correct registration
with a photoresist coated wafer and performs a
uniformly illuminated exposure through the mask
with a filtered high-pressure mercury arc lamp.
This is a contact aligner, as the photomask and the
substrate wafer are brought into physical contact
during the exposure. This is the primary instrument
for performing photolithography pattern transfer.
Uses 4 x 5 inch or 4-inch
square photomask plates. Chuck accepts up to a
2-inch wafer, but smaller wafer fragments can also
be handled. 200 Watt Hg arc lamp exposure source.
Timed exposure of typically around 10 seconds. Foot
operated contact/separate modes. Has both
split-field and row-and-column microscope modes.
WIth a tuned-up photoresist process, space and
trace patterns of 3 microns pitch can be printed.
Registration accuracy is about 5 microns.
Only wafers with thicknesses
less than 1 mm are acceptable on the chuck.
EE/CSE B017; EE MFL
Photolithography Room
