Aligner, 2-Inch

KASPER-QUINTEL MODEL 17A  

This instrument precisely positions a photomask into correct registration with a photoresist coated wafer and performs a uniformly illuminated exposure through the mask with a filtered high-pressure mercury arc lamp. This is a contact aligner, as the photomask and the substrate wafer are brought into physical contact during the exposure. This is the primary instrument for performing photolithography pattern transfer.

SPECIFICATIONS
MATERIALS

Uses 4 x 5 inch or 4-inch square photomask plates. Chuck accepts up to a 2-inch wafer, but smaller wafer fragments can also be handled. 200 Watt Hg arc lamp exposure source. Timed exposure of typically around 10 seconds. Foot operated contact/separate modes. Has both split-field and row-and-column microscope modes. WIth a tuned-up photoresist process, space and trace patterns of 3 microns pitch can be printed. Registration accuracy is about 5 microns.

Only wafers with thicknesses less than 1 mm are acceptable on the chuck.

STATUS
LOCATION
ACCESS CONTACT
TECHNICAL CONTACT
Operational.

EE/CSE B017; EE MFL Photolithography Room

R. B. Darling
R. B. Darling