|
|
This instrument precisely positions a photomask into correct registration with a photoresist coated wafer and performs a uniformly illuminated exposure through the mask with a filtered high-pressure mercury arc lamp. This is a contact aligner, as the photomask and the substrate wafer are brought into physical contact during the exposure. This is the primary instrument for performing photolithography pattern transfer. |
|
|
|
|
Uses 4-inch square photomask plates. Chuck accepts up to a 3-inch wafer, but smaller wafer fragments can also be handled. 300 Watt Hg arc lamp exposure source with direct timer and integrator control. Has only row-and-column microscope. WIth a tuned-up photoresist process, space and trace patterns of 2 microns pitch can be printed. Registration accuracy is about 3 microns. Model 87230 arc lamp housing, 68810 arc lamp supply, and 84360 timer/integrator. |
Only wafers with thicknesses less than 1 mm are acceptable on the chuck. |
|
|
|
|
|
|
|
EE/CSE B017; |
|
|
