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This instrument precisely positions a photomask into correct registration with a photoresist coated wafer and performs a uniformly illuminated exposure through the mask with a filtered high-pressure mercury arc lamp. This is a contact aligner, as the photomask and the substrate wafer are brought into physical contact during the exposure. This is the primary instrument for performing photolithography pattern transfer. |
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Uses 5-inch square photomask plates. Chuck accepts up to a 4-inch wafer, but smaller wafer fragments can also be handled. 300 Watt Hg arc lamp exposure source with direct timer and integrator control. Does not have any alignment microscope at present, but can be used for flood exposures. Has integrated vibration isolation bench. WIth a tuned-up photoresist process, space and trace patterns of 2 microns pitch can be printed. Registration accuracy is about 3 microns. Model 87311 arc lamp housing, 68811 arc lamp supply, and 84360 timer/integrator. |
Only wafers with thicknesses less than 1 mm are acceptable on the chuck. |
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Operational. Will be upgraded to have split-field alignment microscope as part of NSF CRCD educational grant. |
EE/CSE B017; EE MFL Photolithography Room |
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