configuration. Contains three 6-inch diameter water
cooled targets with a fourth position for substrate
etching. 1000 Watt RF (13.56 MHz) power supply. CTI
Cryogenics cryopumped high vacuum chamber with
electric hoist. MKS wide range thermocouple,
capacitance, and ionization vacuum instrumentation.
Closed-loop feedback pressure control using
servomotor on venetian blind throttle valve.
Allowable substrates are Si,
GaAs, Al2O3, SiC, SiO2, and InP. Existing bonded-up
targets include SiO2, Si3N4, 7059 glass, 7570 Iwaki
glass, 7740 pyrex glass, and soda-lime glass. No
metals are allowed in this system in order to allow
it to continue to produce optical quality thin
films. Sputtering gases include Ar, N2, O2, and