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This equipment is a four-position 6-inch diameter quartz tube furnace stack. The four positions are from top to bottom, respectively: Boron doping, Dry gate oxide, Wet field oxide, and Metal annealing. |
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Has Canary Systems automatic boat loader. Hard plumbed into special clean room heat exhaust canopy. |
Only MOS-clean silicon wafers are allowed in this system. In the gate and field oxide tubes, only silicon wafers with oxide or nitride layers are allowed. Metallized silicon wafers are allowed only in the annealing tube. |
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Needs installation to be completed. Being installed and upgraded as part of NSF CRCD educational grant. |
EE/CSE B023; EE MFL Clean Room |
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