MOS Wet Bench

Hamilton Model Safeaire 

This is a built-in wet bench and fume hood combination that is reserved for MOS-grade silicon wafer processing. It is used for wafer cleaning, HF-based oxide etching, and oxide stripping.

SPECIFICATIONS
MATERIALS

Plastic ware tanks for etching. Fluoropolymer plastic ware is used for HF and BOE etching processes.

ONLY substrates containing Si, O, and N are allowed at this bench. No metals are allowed. Only CMOS-grade chemicals are allowed.

STATUS
LOCATION
ACCESS CONTACT
TECHNICAL CONTACT

Operational

EE/CSE B023A; EE MFL Wet Etching Room

R. B. Darling
R. B. Darling