MOS Wet Bench

Hamilton Model Safeaire 

This is a built-in wet bench and fume hood combination that is reserved for MOS-grade silicon wafer processing. It is used for wafer cleaning, HF-based oxide etching, and oxide stripping. SPECIFICATIONS MATERIALS Plastic ware tanks for etching. Fluoropolymer plastic ware is used for HF and BOE etching processes. ONLY substrates containing Si, O, and N are allowed at this bench. No metals are allowed. Only CMOS-grade chemicals are allowed. STATUS LOCATION ACCESS CONTACT TECHNICAL CONTACT Operational EE/CSE B023A; EE MFL Wet Etching Room R. B. Darling R. B. Darling