Non-MOS Wet Bench

Hamilton Model Safeaire

This is a built-in wet bench and fume hood combination that is reserved for wet processing of wafers that contain substances that cannot be put in the MOS wet bench. It is used for cleaning and etching. Anisotropic KOH etching is performend on this bench.

SPECIFICATIONS
MATERIALS

Plastic ware tanks for etching. Some baths have heater and spin-bar stirrer equipment.

ONLY clean silicon wafers are allowed at this bench, but they do not have to be MOS-grade clean. Only CMOS-grade chemicals are allowed.

STATUS
LOCATION
ACCESS CONTACT
TECHNICAL CONTACT

Operational

EE/CSE B023A; EE MFL Wet Etching Room

R. B. Darling
R. B. Darling