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This is a built-in wet bench and fume hood combination that is reserved for the dispensing, spinning, development, and stripping of photoresist. The bench is designed to accomodate the organic solvents associated with photoresist processing. |
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Hot plates and bench-top spinners are installed for photoresist baking and coating operations. |
Only positive photoresist is allowed. Other spinners will be made available for photoresist development and for spinning on organic films such as polyimides and epoxies. |
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Operational |
EE/CSE B017; EE MFL Photolithography Room |
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