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This is a 6-inch diameter quartz tube furnace designed for heat treating substrates that do not significantly outgas or decompose. It is used mainly for annealing, sintering, alloying, firing substrates of up to 4-inch diameter. |
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8000 Watt furnace. Three zone (6", 12", 6") heating elements, independently controllable up to 1200 C. K-type thermocouple instrumentation. |
Allowable substrates are Si, GaAs, Al2O3, SiC, SiO2, and InP. Substrates may contain various metallizations. |
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Operational |
EE/CSE B029; EE MFL Processing Room |
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